High Purity Cu SputteringTarget

High Purity Cu SputteringTarget

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ZhongNuo Copper sputtering targets are made of high purity raw materials, and have uniform microstructure guaranteed by patented thermo-mechanical pro­cess.

Purity: 4N5, 6N

Microstuctuer: Uniform equiaxed fine grain and consistent microstructure. Application: Electronics & Semiconductor, Solar Photovoltaic Systems, Displays, Magnetic Data Storage.

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